@InProceedings{MelloUedOliReuLep:2009:EnSuPr,
               author = "Mello, Carina Barros de and Ueda, M{\'a}rio and Oliveira, 
                         Rog{\'e}rio de Moraes and Reuther, H. and Lepienski, C. M.",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Research Center 
                         Dresden-Rossendorf} and {Universidade Federal do Paran{\'a}}",
                title = "Enhancement of Surface Properties of SAE 1070 by Chromium Plasma 
                         Immersion Ion Implantation and Deposition",
                 year = "2009",
         organization = "International Workshop on Plasma-Based Ion Implantation and 
                         Deposition, 10. (PPI\&D).",
             abstract = "High carbon steels are used in plane pieces and processes of low 
                         forming. Their main characteristic is the high mechanical 
                         resistance and good tenacity. They are mostly used in the 
                         automobile industries, electroelectronics, building sites, and 
                         also as springs, rings, pins, knives etc. This group of steel 
                         possesses a higher percentage of carbon, that facilitates to 
                         obtain pieces with high hardness and high flexibility, but as all 
                         carbon steels, they are very susceptible to severe corrosion. It 
                         is well known that chromium content above 12% in Fe alloys 
                         increases significantly their corrosion resistance. In order to 
                         obtain this improvement, we studied the introduction of chromium 
                         atoms into the matrix of SAE 1070 steel by Plasma Immersion Ion 
                         Implantation and Deposition (PIII\&D) method, in which an RF 
                         magnetron sputtering (MS) is used as the metal plasma source. 
                         Chromium films were deposited by RF magnetron sputtering only and 
                         compared with one formed by PIII\&D at 10kV, 40 {\`{\i}}s, 300 
                         Hz for 60 minutes. Potentiodynamic scans showed that chromium 
                         films formed by PIII\&D leads to a gain in the corrosion 
                         potential and the decrease in the corrosion current density, 
                         promoting bigger corrosion resistance. Furthermore, PIII\&D 
                         chromium films were much more adherent to the samples surface than 
                         MS films. Other characterization tests as nanoindentation, Auger 
                         Electron Spectroscopy, pin-on-disk tribology, scratching test and 
                         surface morphology will be shown in the conference.",
  conference-location = "S{\~a}o Jos{\'e} dos Campos, SP",
      conference-year = "7-11 Sept.",
        urlaccessdate = "08 maio 2024"
}